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Friday 13th December 2002
iSuppli has released its estimated rankings for the 2002 semiconductor market. The top ten account for 48.3% of the market and the No.1 spot for 15.1%.
Friday 13th December 2002
SZ Testsysteme creditors have decided to shut the business down. A creditors committee is currently considering a continuation of the operational business by a rescue company. In this regard there are two offers.
Thursday 12th December 2002
Alcatel Vacuum Technology is ramping up production of its compact 27 m3/h (16 cfm) dry pump to face increasing market demand.
Thursday 12th December 2002
A leading European semiconductor manufacturer has placed an order for NuTool’s integrated 300mm LuminaCu system. The system is configured with patented electrochemical mechanical deposition (ECMD) and reverse linear chemical mechanical planarisation (RL-CMP) process modules for Cu damascene development at the 65nm technology node and beyond. The LuminaCu system delivers up to 60 wafers per hour for typical Cu CMP applications. For Cu plating applications, the LuminaCu ECMD system with its patented super planar deposition technology delivers up to 90 wafers per hour. NuTool will ship the system to the customer in Q1 2003.
Thursday 12th December 2002
Singapore foundry Chartered Semiconductor Manufacturing reports improved expectations in Q4. Revenues, shipments and fab utilisation levels are all set to be higher than previous guidance (October 25, 2002) suggested.
Thursday 12th December 2002
DuPont Photomasks’ European production facilities in Rousset, France and Hamburg, Germany, are to be “consolidated” into the company’s site Corbeil, France, in a cost cutting effort.
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Thursday 12th December 2002
Novellus Systems closed its acquisition of SpeedFam-IPEC - a supplier of CMP systems used in the fabrication of advanced copper interconnects.
Thursday 12th December 2002
Infineon Technologies and Semiconductor Manufacturing International (SMIC) of China are to co-operate on the production of standard memory chips (DRAMs).
Thursday 12th December 2002
Researchers from Agere Systems claim that electrical breakdown in thin-film dielectrics is based on an uncorrelated build-up of defects (Nature, November 28, 2002). This contrasts with thick films where the presence of defects makes it easier for new ones to form resulting in a catastrophic failure. The scientists compared measurements on 100 FETs with an uncorrelated model and found good agreement.
Thursday 12th December 2002
The draft Sixth Framework Program (FP6) information society technologies (IST) research agenda for the European Union contains plans for pushing the limits of CMOS and preparing for post-CMOS and micro and nano system development. The draft is in the process of European Commission adoption and is not a binding document.
Thursday 12th December 2002
This week is the International Electron Devices Meeting (IEDM), December 8-11, in San Francisco, California. We have presented some of the research already in previous weeks. Here are some details of work at STMicroelectronics, IBM and of collaboration at Toshiba and Sony.
Wednesday 11th December 2002
Infineon Technologies presented nine reports on technology development and new research to the 2002 International Electron Devices Meeting (IEDM), December 9-11, 2002.
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Tuesday 10th December 2002
SUSS MicroTec says it offers a cost-effective alternative to high-resolution electron beam lithography for printing sub-100nm geometries with three embossing tools based on its mask aligner and bonding tools.
Monday 9th December 2002
Infineon Technologies and Semiconductor Manufacturing International (SMIC) of China are to co-operate on the production of standard memory chips (DRAMs).
Friday 6th December 2002
Donaldson High Purity Products, a division of the Donaldson Company, Inc. focused on the design and manufacture of gas-phase contaminant filtration solutions for the semiconductor industry, today announced immediate availability of a new point-of-use filter. Designed in cooperation with major optical lithography tool manufacturers and employing multiple filtration mechanisms, the LITHOGUARD POU effectively controls gas-phase contamination that effects image quality and causes degradation of optical elements, thereby improving yield rates and increasing uptime of lithography exposure tools. With the capability for removing bases, acids and organic gas phase contaminants at high efficiencies, the LITHOGUARD POU is ideal for the chemical filtration of pressurized air streams in critical point-of-use applications. For more information: http://www.donaldson.com/en/semiconductor/index.html Or e-mail : [email protected]
Friday 6th December 2002
Donaldson is a supplier of chemical filtration solutions for the Semiconductor industry with products targeted at high efficiency removal of airborne molecular contaminants of concern to processes and tools. The product range includes Point-of-Use filters with applications for process air, CDA and nitrogen, chemical filtration systems for tools (Lithography, Vertical Furnaces, Mask making... ) and a new range of laminar flow, low pressure drop media for minienvironments (wafer stockers, reticle stockers, laminar flow benches) All these applications require filtration to sub-ppb levels of bases, organics and acid gases and careful selection of low-offgassing materials. Based in Leuven, Belgium, Donaldson Europe serves the European Semiconductor market. Please Click Here for more information.
Friday 6th December 2002
Texas Instruments topped rankings for wireless communication IC supply with forecast 2002 sales of $1.85bn, according to IC Insights.
Thursday 5th December 2002
Agility Communications, Alcatel Optronics and Bookham Technology announced a multi-source agreement (MSA) for tunable laser sources.
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Thursday 5th December 2002
IC test system supplier Credence Systems has entered into a definitive agreement to acquire US company Optonics, a supplier of emission-based optical diagnostics and failure analysis (FA).
Thursday 5th December 2002
Tokyo Electron (TEL) has announced the production and delivery schedule for its next generation 300mm coater/developer, Clean Track Lithius, to begin shipments in January 2004.
Thursday 5th December 2002
IBM and Singapore foundry Chartered Semiconductor Manufacturing have made a joint development and manufacturing agreement.
Wednesday 4th December 2002
DuPont Photomasks European production facilities in Rousset, France and Hamburg, Germany, are to be "consolidated" into the companys site Corbeil, France, in a cost cutting effort.
Tuesday 3rd December 2002
Singapore foundry Chartered Semiconductor Manufacturing reports improved expectations in Q4. Revenues, shipments and fab utilisation levels are all set to be higher than previous guidance (October 25, 2002) suggested.
Tuesday 3rd December 2002
Toshiba and Sony are claiming the worlds first 65nm CMOS process technology for embedded DRAM system LSI (large scale integration) chips.

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