News Article
IMEC Enters 300mm Domain
IMEC is setting up a 300mm silicon research platform initiative. The aim is
to perform advanced process research at least two generations ahead of
manufacturing. IMEC's local Flemish government will provide funding of
EUR37.18mn for the cleanroom construction.
The goal of the research platform is to demonstrate novel device
architectures and to perform research on process steps and modules. It will
be built around the world's most advanced lithography clusters such as 157nm
and extreme ultraviolet (EUV).
The new fab will be located next to current IMEC facilities. Strategic
long-term partnerships with a core set of equipment suppliers and major IC
manufacturers will be set up to carry the investments.
This new lab will also allow the freeing up of space in the current 200mm
cleanroom for research into a range of nanotechnology domains.
architectures and to perform research on process steps and modules. It will
be built around the world's most advanced lithography clusters such as 157nm
and extreme ultraviolet (EUV).
The new fab will be located next to current IMEC facilities. Strategic
long-term partnerships with a core set of equipment suppliers and major IC
manufacturers will be set up to carry the investments.
This new lab will also allow the freeing up of space in the current 200mm
cleanroom for research into a range of nanotechnology domains.
