IMEC Enters 300mm Domain
IMEC is setting up a 300mm silicon research platform initiative. The aim is to perform advanced process research at least two generations ahead of manufacturing. IMEC's local Flemish government will provide funding of EUR37.18mn for the construction of the cleanroom.
The goal of the research platform is to demonstrate novel device architectures and to perform research on process steps and modules. It will be built around the world's most advanced lithography clusters such as 157nm and extreme ultraviolet (EUV).
The new fab will be located next to current IMEC facilities. Strategic long-term partnerships with a core set of equipment suppliers and major IC manufacturers will be set up to carry the investments.
This new lab will also allow the freeing up of space in the current 200mm cleanroom for research into a broad range of nanotechnology domains.