News Article
Mattson Technology And Varian Semiconductor Equipment Associates
Mattson Technology and Varian Semiconductor Equipment Associates have
installed equipment for a joint development programme on ultra-shallow
junction and other implant processes. A Mattson 3000 Plus advanced thermal
processing system has been fitted out at Varian Semiconductor's facility in
Massachusetts.
The development team will use the 3000 Plus and VSEA's ion implant tools to
develop transistor formation technologies for 65nm and smaller device
structures. The companies will first focus their efforts on ultra-shallow
junction formation. This will be followed by additional activities aimed at
furthering the integration of front-end-of-line transistor fabrication.
develop transistor formation technologies for 65nm and smaller device
structures. The companies will first focus their efforts on ultra-shallow
junction formation. This will be followed by additional activities aimed at
furthering the integration of front-end-of-line transistor fabrication.
