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Leica Microsystems Lithography Is To Deliver An Electron Beam Lithography

Wednesday 1st January 2003

Leica Microsystems Lithography is to deliver an electron beam lithography system to the Fraunhofer Institute for Microelectronic Circuits and Systems (IMS) in Dresden, Germany. The tool will be able to direct write on silicon wafers and produce photomasks. IMS produces both ICs and microsystems.
Leica Microsystems Lithography is to deliver an electron beam lithography

system to the Fraunhofer Institute for Microelectronic Circuits and Systems

(IMS) in Dresden, Germany. The tool will be able to direct write on silicon

wafers and produce photomasks. IMS produces both ICs and microsystems.



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