News Article
Metron Technology And Cabot Microelectronics Have Modified Their
Metron Technology and Cabot Microelectronics have modified their
distribution agreement. Cabot Microelectronics will assume direct
distribution of its products in Europe, Singapore and Malaysia effective
from June 1, 2003. Metron will continue to distribute Cabot's products in
Israel.
"In fiscal 2002, Cabot Microelectronics revenues in Europe, Singapore, and
Malaysia represented approximately 13% of Metron's revenue," reports Ed
Segal, chairman and CEO of Metron. "While we are disappointed by the
decision, this is a known risk in our business and one which we have
encountered and overcome before."
Separately, Novellus Systems has selected Metron Technology as its exclusive
partner to refurbish Novellus' legacy systems, including products acquired
from Varian Associates' Thin Film Systems division and Gasonics
International. The agreement is inclusive of Novellus' Concept One series of
chemical vapour deposition (CVD) systems, Varian's in-line physical vapor
deposition (PVD) systems, and Gasonics' Aura photoresist and residue removal
systems. Metron will make equipment in Scotland and California.
Taiwan non-volatile memory maker Macronix International has selected
Brooks-PRI Automation's Automated Material Handling System (AMHS) -
including stockers, AeroTrak, AeroLoader overhead hoist transport vehicles
and TransNet material control software. The equipment and software will be
used on a 200mm production line and a 300mm test line in Macronix' Fab 3.
Samsung Electronics has ordered a double-chamber spin processor 223 from
SEZ. This 200mm single-wafer tool will be used in Samsung's research and
development line for backside clean and bevel undercut etch. Shipment is
scheduled for H2 2002.
SEZ's chief marketing officer, Kurt Lackenbucher, comments: "The bevel
undercut capability is unique to SEZ spin-processors and is becoming a
necessity especially for copper and low-k applications where contamination
issues are most critical."
UMC has deployed Numerical Technologies' Virtual Stepper and i-Virtual
Stepper simulation-based mask qualification products. The software is
designed to significantly reduce the number of mask rejections and
false-defect repairs, thereby decreasing both the cost and turnaround time
to acquire advanced photomasks for production.
Malaysia represented approximately 13% of Metron's revenue," reports Ed
Segal, chairman and CEO of Metron. "While we are disappointed by the
decision, this is a known risk in our business and one which we have
encountered and overcome before."
Separately, Novellus Systems has selected Metron Technology as its exclusive
partner to refurbish Novellus' legacy systems, including products acquired
from Varian Associates' Thin Film Systems division and Gasonics
International. The agreement is inclusive of Novellus' Concept One series of
chemical vapour deposition (CVD) systems, Varian's in-line physical vapor
deposition (PVD) systems, and Gasonics' Aura photoresist and residue removal
systems. Metron will make equipment in Scotland and California.
Taiwan non-volatile memory maker Macronix International has selected
Brooks-PRI Automation's Automated Material Handling System (AMHS) -
including stockers, AeroTrak, AeroLoader overhead hoist transport vehicles
and TransNet material control software. The equipment and software will be
used on a 200mm production line and a 300mm test line in Macronix' Fab 3.
Samsung Electronics has ordered a double-chamber spin processor 223 from
SEZ. This 200mm single-wafer tool will be used in Samsung's research and
development line for backside clean and bevel undercut etch. Shipment is
scheduled for H2 2002.
SEZ's chief marketing officer, Kurt Lackenbucher, comments: "The bevel
undercut capability is unique to SEZ spin-processors and is becoming a
necessity especially for copper and low-k applications where contamination
issues are most critical."
UMC has deployed Numerical Technologies' Virtual Stepper and i-Virtual
Stepper simulation-based mask qualification products. The software is
designed to significantly reduce the number of mask rejections and
false-defect repairs, thereby decreasing both the cost and turnaround time
to acquire advanced photomasks for production.
