News Article
International SEMATECH (ISMT) And The State University Of New York (SUNY)
International SEMATECH (ISMT) and the State University of New York (SUNY)
University at Albany-SUNY (UAlbany) plan a joint five-year $320m programme
on next generation lithography. The letter of intent calls for negotiations
to start immediately on the formation of a strategic alliance - to be known
as International SEMATECH North (ISMTN) - to conduct R&D on advanced
lithography infrastructure for extreme ultraviolet (EUV) processes. The
programme would be managed by International SEMATECH and housed in UAlbany's
300mm wafer facility. A final agreement on the strategic alliance is hoped
for by the end of Q3 this year.
A "tabletop" experimental set up has been used to create an extreme
ultraviolet (EUV) laser beam of photons centred in energy around 31eV or a
wavelength of around 40nm (Science, July 19). The technique could be used
beyond 500eV (2.5nm), the authors claim.
The light source was a high repetition (5kHz, 0.8mJ/pulse) Ti:sapphire laser
operating at a 760nm wavelength. The light is focused into a 10cm long,
150micron diameter hollow core fibre filled with argon gas to produce
"high-harmonic generation" (HHG). The arrangement produces odd harmonics of
the exciting laser freqency. In this experiment orders 17 to 23 were
excited.
The work involved scientists from the University of Colorado, the US
National Institute of Standards and Technology (NIST), Sofia University in
Bulgaria, the Lawrence Berkeley US National Laboratory, the Univeristy of
California-Berkeley and the State University of New York (SUNY) at Stony
Brook.
The researchers previously worked on producing a simpler lower cost version
of the 760nm laser, which can cost up to $100,000 commercially. The result
was a machine costing $5000 in parts. This has now been commercialised and
the team is looking to sell its EUV system.
A combined x-ray/neutron reflectometry analysis has been used to study the
reaction front in chemically amplified (CA) photoresist development
(Science, July 19). The team achieved nanometre resolutions. Deuterium
labelled reactant groups were used to provide neutron scattering contrast.
The reaction front was found to be broad rather than sharply defined. The
compositional profile alters during development of the resist. The work
involved scientists from the US National Institute of Standards and
Technology (NIST), IBM's TJ Watson Research Center and the University of
Texas at Austin.
ultraviolet (EUV) laser beam of photons centred in energy around 31eV or a
wavelength of around 40nm (Science, July 19). The technique could be used
beyond 500eV (2.5nm), the authors claim.
The light source was a high repetition (5kHz, 0.8mJ/pulse) Ti:sapphire laser
operating at a 760nm wavelength. The light is focused into a 10cm long,
150micron diameter hollow core fibre filled with argon gas to produce
"high-harmonic generation" (HHG). The arrangement produces odd harmonics of
the exciting laser freqency. In this experiment orders 17 to 23 were
excited.
The work involved scientists from the University of Colorado, the US
National Institute of Standards and Technology (NIST), Sofia University in
Bulgaria, the Lawrence Berkeley US National Laboratory, the Univeristy of
California-Berkeley and the State University of New York (SUNY) at Stony
Brook.
The researchers previously worked on producing a simpler lower cost version
of the 760nm laser, which can cost up to $100,000 commercially. The result
was a machine costing $5000 in parts. This has now been commercialised and
the team is looking to sell its EUV system.
A combined x-ray/neutron reflectometry analysis has been used to study the
reaction front in chemically amplified (CA) photoresist development
(Science, July 19). The team achieved nanometre resolutions. Deuterium
labelled reactant groups were used to provide neutron scattering contrast.
The reaction front was found to be broad rather than sharply defined. The
compositional profile alters during development of the resist. The work
involved scientists from the US National Institute of Standards and
Technology (NIST), IBM's TJ Watson Research Center and the University of
Texas at Austin.
