JSR Micro Opens European Manufacturing Facility
The plant will initially focus producing advanced KrF (Krypton Flouride Excimer Laser) photosensitive resists using a state-of-the art manufacturing process. The focus for these resists will be 246nm lithography. The production capacity of the new plant for photoresists will be 200,000 litres (approximately 50,000 gallons) per year. In addition to KrF photoresist, initial manufacturing will include photoresist developers. The company plans to allocate space at the manufacturing site for future production of new semiconductor materials such as interlayer dielectric materials (Low-K materials) and chemical-mechanical polish (CMP) materials.
The new facility has an automated ‘bar-coded' system that enables complete tracking of resources and reduces cycle time drastically. The clean room is fully equipped with advanced lithography clusters to enable constant research. The company expects the acility to be at full production capacity by Q2/Q3 of next year.
