News Article
Investment & Expansion
Toshiba has decided "in principle" to build 300mm wafer production
facilities. Production lines will be set up in two major Japanese facilities
in Oita and Yokkaichi. The investment programme will extend over four years
from 2003 and is expected to total JPY350bn.
Toshiba has decided "in principle" to build 300mm wafer production
facilities. Production lines will be set up in two major Japanese facilities
in Oita and Yokkaichi. The investment programme will extend over four years
from 2003 and is expected to total JPY350bn.
The production line at Oita will mass-produce system LSIs for broadband
network applications, using the companys embedded DRAM process technology.
The facility is expected to adopt 45nm process technology in the future.
Mass production is scheduled to start in 2004.
The facility at Yokkaichi will mass-produce NAND-type Flash memories. Mass
production is expected to begin in 2006.
facilities. Production lines will be set up in two major Japanese facilities
in Oita and Yokkaichi. The investment programme will extend over four years
from 2003 and is expected to total JPY350bn.
The production line at Oita will mass-produce system LSIs for broadband
network applications, using the companys embedded DRAM process technology.
The facility is expected to adopt 45nm process technology in the future.
Mass production is scheduled to start in 2004.
The facility at Yokkaichi will mass-produce NAND-type Flash memories. Mass
production is expected to begin in 2006.
