News Article
Genus Wins ALD Non-infringement Decisions
A federal district court has ruled that Genus does not infringe two US patents (Nos.6,015,590 and 5,916,365) on atomic layer deposition (ALD) technology owned by European company ASM International.
A federal district court has ruled that Genus does not infringe two US patents (Nos.6,015,590 and 5,916,365) on atomic layer deposition (ALD) technology owned by European company ASM International. The judge ruled that Genus products do not meet the "evacuating" limitation of the 590 patent.
One claim against Genus remains involving ASMIs US patent on "Apparatus for Chemical Vapor Deposition (CVD), using an axially symmetric gas flow" (No.4,798,165). The US firm is further claiming that ASMI infringes Genus patent on "Method of Selective Etching Native Oxide" (No.5,294,568). In particular, Genus believes that ASMIs Polygon tool infringes the its patent with respect to an HF vapour clean module. These claims have yet to be decided.
ASM Americas president, Danial Queyssac, commented: "We vigorously disagree with the courts interpretation of the term, evacuating, and look forward to appeal and vindication in the US Court of Appeals for the Federal Circuit at a later date."
