Aixtron Buys Up Patents For Atomic Control

AVD uses Aixtrons experience in depositing materials in complex formations, as is common in the compound semiconductor industry (e.g. heterojunctions and semiconductor lasers). Using the TriJet delivery of precursor in a pulsed mode to the MOCVD tool, complex layers of high-k gate oxide replacement can be built up far faster than in competing atomic layer deposition/CVD (ALD or ALCVD) methods. Faster deposition means higher throughput.

To date, Aixtron has held exclusive licenses from J.I.P.ELEC for this technology in conjunction with a 7.4% stake in the equity of this supplier of modules and systems for semiconductor processing. Now, Aixtron has divested its shareholding back to J.I.P.ELEC, acquired the TriJet related patent and license portfolio and has granted patent licenses for niche applications back to J.I.P.ELEC.

In addition, J.I.P.ELEC also assigned a previously exclusive license for a patent owned by the governmental research institute CNRS (France) to Aixtron. Again, Aixtron has granted a sub-license for certain technology niche applications back to J.I.P.ELEC. The transaction follows the recently announced acquisition of J.I.P.ELEC by Qualiflow, France. As part of Aixtron's outsourcing strategy, Qualiflow will continue to produce the TriJet after the acquisition of J.I.P.ELEC by Qualiflow as the exclusive supplier for this advanced sub system assembly.

A fuller report on the technology is available in European Semiconductor, November 2002.