News Article
Intellectual Property
A federal district court has ruled that Genus does not infringe two US
patents (Nos.6,015,590 and 5,916,365) on atomic layer deposition (ALD)
technology owned by European company ASM International. The judge ruled
that Genus products do not meet the "evacuating" limitation of the 590
patent.
A federal district court has ruled that Genus does not infringe two US
patents (Nos.6,015,590 and 5,916,365) on atomic layer deposition (ALD)
technology owned by European company ASM International. The judge ruled
that Genus products do not meet the "evacuating" limitation of the 590
patent.
patents (Nos.6,015,590 and 5,916,365) on atomic layer deposition (ALD)
technology owned by European company ASM International. The judge ruled
that Genus products do not meet the "evacuating" limitation of the 590
patent.
One claim against Genus remains, involving ASMIs US patent on "Apparatus
for Chemical Vapor Deposition (CVD), using an axially symmetric gas flow"
(No.4,798,165). The US firm is further claiming that ASMI infringes Genus
patent on "Method of Selective Etching Native Oxide" (No.5,294,568). In
particular, Genus believes that ASMIs Polygon tool infringes the patent
with respect to an HF vapour clean module. These claims have yet to be
decided.
ASM Americas president, Danial Queyssac, commented: "We vigorously
disagree with the courts interpretation of the term, evacuating, and
look forward to appeal and vindication in the US Court of Appeals for the
Federal Circuit at a later date."
