MOLECULAR CONTAMINATION
1. WAFER SURFACES
As feature sizes continue to shrink, surface damage from molecular contamination becomes a larger and larger problem. AiM gives you real-time monitoring of incremental depositions of condensables as small as 0.02Ng/cm2.
2. OPTICAL COMPONENTS
Both aerospace and photolithography suffer from hazing of critical optics, sometimes even requiring replacement instead of cleaning. In fabs this problem will grow exponentially in the move to 193nm systems and beyond. AiM measures deposition of organic condensables that can form haze on mirrors and lenses.
3. METALLIC SURFACES
Sensitive disk drive heads can be ruined by exposure to trace concentrations of acidic vapors. Similarly, increased use of copper makes the semiconductor industry more and more vulnerable. Particle Measuring Systems now offers AiM sensors coated with copper or other metals to provide real-time monitoring of critical metallic surfaces.
4. FILTER BREAKTHROUGH
Industry is increasingly using chemical filtering to reduce the surface damage caused by molecular contamination. With selectable surfaces for detecting either condensables or acids, AiM can monitor and alarm as the deleterious molecules break through the filters.
For more information, call +44 1684 581000 or visit at www.surfacemc.com. For application notes regarding molecular contamination go to http://www.pmeasuring.com/particle/education/appNotes/molecular
1. WAFER SURFACES
As feature sizes continue to shrink, surface damage from molecular contamination becomes a larger and larger problem. AiM gives you real-time monitoring of incremental depositions of condensables as small as 0.02Ng/cm2.
2. OPTICAL COMPONENTS
Both aerospace and photolithography suffer from hazing of critical optics, sometimes even requiring replacement instead of cleaning. In fabs this problem will grow exponentially in the move to 193nm systems and beyond. AiM measures deposition of organic condensables that can form haze on mirrors and lenses.
3. METALLIC SURFACES
Sensitive disk drive heads can be ruined by exposure to trace concentrations of acidic vapors. Similarly, increased use of copper makes the semiconductor industry more and more vulnerable. Particle Measuring Systems now offers AiM sensors coated with copper or other metals to provide real-time monitoring of critical metallic surfaces.
4. FILTER BREAKTHROUGH
Industry is increasingly using chemical filtering to reduce the surface damage caused by molecular contamination. With selectable surfaces for detecting either condensables or acids, AiM can monitor and alarm as the deleterious molecules break through the filters.
For more information, call +44 1684 581000 or visit at www.surfacemc.com. For application notes regarding molecular contamination go to http://www.pmeasuring.com/particle/education/appNotes/molecular
