News Article
Process Development
IMECs board of directors announced the construction of a new 300mm
cleanroom based on a detailed engineering study made in 2002 and positive
signals of industry and local government support.
IMECs board of directors announced the construction of a new 300mm
cleanroom based on a detailed engineering study made in 2002 and positive
signals of industry and local government support. Construction of the new
2200m2 research fab will begin in February 2003, with completion due in 18
months. The facility is expected to go on-line in mid 2005, with activities
gradually ramping up. The initiative involves an investment of EUR84mn of
which EUR37mn has been granted by local government. The new fab will be
located adjacent to IMECs existing facilities.
Several IMEC research programmes will be set up to target the most important
issues identified by the International Technology Roadmap for Semiconductors
for the sub-45nm node. The focus will be EUV lithography, new materials,
advanced devices and innovative interconnect schemes. The programmes will be
open to semiconductor companies and material and equipment suppliers
worldwide.
cleanroom based on a detailed engineering study made in 2002 and positive
signals of industry and local government support. Construction of the new
2200m2 research fab will begin in February 2003, with completion due in 18
months. The facility is expected to go on-line in mid 2005, with activities
gradually ramping up. The initiative involves an investment of EUR84mn of
which EUR37mn has been granted by local government. The new fab will be
located adjacent to IMECs existing facilities.
Several IMEC research programmes will be set up to target the most important
issues identified by the International Technology Roadmap for Semiconductors
for the sub-45nm node. The focus will be EUV lithography, new materials,
advanced devices and innovative interconnect schemes. The programmes will be
open to semiconductor companies and material and equipment suppliers
worldwide.