News Article
Photovoltaic Booster
SANYO Electric is to establish a new 10,000m2 JPY4.5bn factory for the production of heterojunction with intrinsic thin layer (HIT) photovoltaic cells and modules. The new factory is to be built in Osaka, Kaizuka City. Production is to start January 2004.
SANYO Electric is to establish a new 10,000m2 JPY4.5bn factory for the production of heterojunction with intrinsic thin layer (HIT) photovoltaic cells and modules. The new factory is to be built in Osaka, Kaizuka City. Production is to start January 2004.
The new plant will double the companys production capacity over current levels. SANYO currently produces photovoltaic cells at Sumoto and Shimane, with a combined annual HIT production output of 30MW. Photovoltaic module assembly will take place at Tokonabe.
SANYOs annual photovoltaic energy production is expected to reach 60MW in January 2004 and 120MW in 2005.
HIT photovoltaic cells are built on single crystalline silicon wafers coated by thin amorphous-silicon layers. The mass production cells have conversion efficiency rates of 18.5%.
