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Korean DRAM Leader Buys Into ASML OPC
Samsung Electronics has signed a licensing agreement for ASML’s technology to be deployed at Samsung’s semiconductor production facilities worldwide. The patented ASML technology is designed to significantly enhance the imaging performance for current and future technology generations. Samsung is licensing the technology through the life of the patents.
Samsung Electronics has signed a licensing agreement for ASML's technology to be deployed at Samsung's semiconductor production facilities worldwide. The patented ASML technology is designed to significantly enhance the imaging performance for current and future technology generations. Samsung is licensing the technology through the life of the patents.
The licensed technology is for placing scattering bars on photomasks to improve imaging performance. Specific benefits include improved depth of focus (DOF), enlarged process latitude, better critical dimension (CD) uniformity and higher manufacturing yields.
ASML supplies lithography technology to the semiconductor industry while the ASML MaskTools subsidiary develops photomask/reticle enhancement technology (RET) such as the scattering bar optical proximity correction (OPC) technique. Financial details of the agreement are not being disclosed.
