European Awards
Blaesing is recognised for her contributions as an R&D project manager to the development of pattern placement metrology. She served as the project leader throughout the development of Leicas LMS IPRO tool. This technology development was sponsored by the Joint European Sub-micron Silicon Initiative (JESSI), and was the result of joint efforts by Leica Microsystems (Germany), Siemens (now Infineon, Germany) IBM France, ST Agrate (Italy) and Fraunhofer Gesellschaft ISIT (Germany). The development enabled Leica to displace a Japanese company as world market leader in 1998.
Monnier received the European SEMI Special Service award, which is given to an individual for extended contribution over the course of a professional career to the development of the European semiconductor industry.
He was recognised for contributions including the demonstration and the implementation of heterogeneous technologies (mixing analogue and logic) at the beginning of the 1990s, the establishment of research cooperation between industry, public laboratories and small and medium sized companies and innovative start ups around Crolles.
Rik Jonckheere of IMEC received the International Collaboration award for leadership of the "Definitions of Specifications (Terminology) for Photomask Fabrication and Qualification" task force. The Leadership award went to Wolfgang Jantz of the Fraunhofer Institute for Applied Solid State Physics for his leadership in guiding SEMI Standards programmes, particularly the 150mm Gallium Arsenide task force. Gerd Limmer of Siemens received the Merit award as a volunteer leader for development of the SEMI S2 safety guideline.
